99.9-B, PURATREM
Trimethylboron
CAS: 593-90-8
Molecular Formula: C3H9B
99.9-B, PURATREM - Names and Identifiers
| Name | Trimethylboron |
| Synonyms | Trimethylboron trimethylborane trimethylborine 99.9-B, PURATREM TRIMETHYLBORON, ELEC. GR. Trimethylboroncolorlessgas Trimethylboronelecgrcolorlessgas |
| CAS | 593-90-8 |
| EINECS | 209-816-3 |
| InChI | InChI=1/C3H9B/c1-4(2)3/h1-3H3 |
99.9-B, PURATREM - Physico-chemical Properties
| Molecular Formula | C3H9B |
| Molar Mass | 55.91 |
| Density | 0,625 g/cm3 |
| Melting Point | -161,5°C |
| Boling Point | -20,2°C |
| Vapor Presure | 907mmHg at 25°C |
| Appearance | liquid |
| Refractive Index | 1.311 |
99.9-B, PURATREM - Risk and Safety
| Risk Codes | R11 - Highly Flammable R17 - Spontaneously flammable in air R34 - Causes burns |
| Safety Description | S9 - Keep container in a well-ventilated place. S16 - Keep away from sources of ignition. S23 - Do not breathe vapour. S45 - In case of accident or if you feel unwell, seek medical advice immediately (show the label whenever possible.) S43 - In case of fire use ... (there follows the type of fire-fighting equipment to be used.) S36/37/39 - Wear suitable protective clothing, gloves and eye/face protection. S26 - In case of contact with eyes, rinse immediately with plenty of water and seek medical advice. S7 - Keep container tightly closed. |
| UN IDs | 3160 |
| Hazard Class | 2.3 |
99.9-B, PURATREM - Reference Information
| overview | amorphous silicon solar cells have the characteristics of low manufacturing cost and easy mass production. they have been widely used in recent years and have received widespread attention. The quality of P-type window materials has an important influence on the performance of solar cells. Improving the characteristics of P-type materials is an effective way to improve the performance of solar cells. At present, amorphous silicon solar cell production lines mainly use diborane or trimethyl boron as dopants. When diborane is used as dopant, the dark conductivity of the material and the optical band gap restrict each other more seriously, mainly because there are B- B bonds and B- H bonds in the molecular structure of diborane. In the process of vapor deposition, the structure of these bonds is easy to grow in the thin film material, resulting in higher defect state density of the material, and the increase of conductivity inhibits the increase of optical band gap. when trimethylboron is used as dopant, there is no B- B bond and B- H bond structure in the molecule, thus effectively reducing the defect state density in the material and improving the doping efficiency. Trimethylboron has good stability, low toxicity, high conversion rate of amorphous silicon solar cells, and can prepare high-quality P-type window materials with wide optical band gap and high conductivity. Judging from the current development trend, trimethylboron has a broader prospect than diborane in the preparation of amorphous silicon solar cells. |
| use | trimethylboron is mainly used in silicon thin film solar cells as a p-type doping source. At present, trimethylboron or diborane is used as the P-type doping source in the production line of silicon thin film solar cells. Compared with diborane, trimethylboron doping can greatly reduce the density of B- B bonds and B atoms in the P material, thus effectively reducing the density of defect states in the material and improving the doping efficiency. Because trimethylboron has good stability, low toxicity, and low pollution, the silicon thin-film solar cell produced has a high conversion rate. It is a high-quality P-type material that can prepare a wide optical band gap and high conductivity. In the long run, it has a tendency to replace diborane. |
Last Update：2024-04-10 22:29:15
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